Atomic Layer Deposition Systems


NorthStar ALD System
NorthStar ALD System

SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8 precursor lines and a hot wall — cross flow deposition chamber, a wide range of applications may be performed from a single system. Sample introduction is rapid and convenient with a quick hatch or the optional load lock. The NorthStar ALD system can be interfaced with other deposition and metrology tools. Integration of in-situ metrology tools and the RoboALD software/system automation increases process reproducibility. SVTA is your source for cost effective atomic layer deposition equipment.

Atomic Layer Deposition System Applications:

  • High-k Dielectrics
  • Nanocoatings
  • Surface Modification Layers
  • Corrosion protection layers
  • Moisture barrier layers
  • Device Encapsulations
  • MEMS
  • Photonic Crystals

Atomic Layer Deposition Equipment Options:

  • Load Lock for rapid sample exchange
  • Plasma Component
  • Ozone Delivery System
  • Residual Gas Analysis — QMS
  • Quartz Crystal Deposition Monitor
  • In-Situ Ellipsometry
  • Transfer to UHV deposition systems

Technical Documentation:

Contact SVTA for more information.

SEM Photo of Nanowires after ALD
SEM Photo of Nanowires after ALD
NorthStar ALD System with Load Lock
NorthStar ALD System
ALD Layer Thickness (nm)
ALD Layer Thickness (nm)
High Resolution TEM of ALD Dielectric
High Resolution TEM of ALD Dielectric